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| Part Name | AuSn Target | Specifications | 304.8 L x 228.6 W x 6 H mm (customized) (Option: Target Bonded to Backing Plate) |
| Material | Au Sn | Purity | 99.99% |
| Common Applications | Semiconductor, Wafer & Chip, Microelectronic Senser, Aerospace, 5G Photoelectricity, Functional Coating | ||
Target material is one of the main materials for preparing thin films, mainly used in integrated circuits, flat panel displays, solar cells, recording media, smart glass, etc., with high requirements for material purity and stability. The working principle of sputtering target material: sputtering is one of the main technologies for preparing thin film materials. It uses ions generated by ion sources to accelerate and aggregate in vacuum, forming a high-speed ion beam that bombards the solid surface. The ions exchange kinetic energy with the solid surface atoms, causing the solid surface atoms to leave the solid and deposit on the substrate surface. The bombarded solid is the sputtering target material.
Introducing the Gold-Tin Target, also known as AuSn Target, a cutting-edge product designed for the semiconductor industry. This highly specialized target is exclusively produced by our company, making us the sole provider in the domestic market.
The Gold-Tin Target is specifically developed for chip manufacturing, offering exceptional performance and reliability. Its unique composition and advanced production techniques make it an ideal choice for demanding applications in the semiconductor industry.
Crafted with utmost precision, this product exhibits unparalleled difficulty in its production process. Our company has successfully mastered the manufacturing technology required for this target, ensuring the highest quality and consistency.
With its exceptional properties, the Gold-Tin Target guarantees superior performance and durability. It enables precise deposition of gold-tin films, facilitating the production of high-quality semiconductor devices.
Choose the Gold-Tin Target for your semiconductor needs and experience the unmatched expertise and professionalism that only our company can provide. Trust in our proven track record and rely on our exclusive production technology to meet your requirements with utmost precision and efficiency.
| Part Name | AuSn Target | Specifications | 304.8 L x 228.6 W x 6 H mm (customized) (Option: Target Bonded to Backing Plate) |
| Material | Au Sn | Purity | 99.99% |
| Common Applications | Semiconductor, Wafer & Chip, Microelectronic Senser, Aerospace, 5G Photoelectricity, Functional Coating | ||
Target material is one of the main materials for preparing thin films, mainly used in integrated circuits, flat panel displays, solar cells, recording media, smart glass, etc., with high requirements for material purity and stability. The working principle of sputtering target material: sputtering is one of the main technologies for preparing thin film materials. It uses ions generated by ion sources to accelerate and aggregate in vacuum, forming a high-speed ion beam that bombards the solid surface. The ions exchange kinetic energy with the solid surface atoms, causing the solid surface atoms to leave the solid and deposit on the substrate surface. The bombarded solid is the sputtering target material.
Introducing the Gold-Tin Target, also known as AuSn Target, a cutting-edge product designed for the semiconductor industry. This highly specialized target is exclusively produced by our company, making us the sole provider in the domestic market.
The Gold-Tin Target is specifically developed for chip manufacturing, offering exceptional performance and reliability. Its unique composition and advanced production techniques make it an ideal choice for demanding applications in the semiconductor industry.
Crafted with utmost precision, this product exhibits unparalleled difficulty in its production process. Our company has successfully mastered the manufacturing technology required for this target, ensuring the highest quality and consistency.
With its exceptional properties, the Gold-Tin Target guarantees superior performance and durability. It enables precise deposition of gold-tin films, facilitating the production of high-quality semiconductor devices.
Choose the Gold-Tin Target for your semiconductor needs and experience the unmatched expertise and professionalism that only our company can provide. Trust in our proven track record and rely on our exclusive production technology to meet your requirements with utmost precision and efficiency.
