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| Part Name | Tantalum Target | Specifications | Ø203.2 x 3mm Thickness (customized) (Option: Target Bonded to Backing Plate) |
| Material | Ta | Purity | 99.99% |
| Common Applications | Semiconductor, Wafer & Chip, Microelectronic Senser, Aerospace, 5G Photoelectricity, Functional Coating | ||
Target material is one of the main materials for preparing thin films, mainly used in integrated circuits, flat panel displays, solar cells, recording media, smart glass, etc., with high requirements for material purity and stability. The working principle of sputtering target material: sputtering is one of the main technologies for preparing thin film materials. It uses ions generated by ion sources to accelerate and aggregate in vacuum, forming a high-speed ion beam that bombards the solid surface. The ions exchange kinetic energy with the solid surface atoms, causing the solid surface atoms to leave the solid and deposit on the substrate surface. The bombarded solid is the sputtering target material.
Introducing our high-quality Tantalum Sputtering Targets, specifically designed for chip coating applications. These Tantalum Sputtering Targets are meticulously crafted to meet the demands of the semiconductor industry. With utmost precision and professionalism, we offer a reliable solution for your coating needs.
Our Tantalum Sputtering Targets are manufactured using advanced techniques, ensuring exceptional purity and consistency. These targets are specifically engineered to provide optimal performance and durability, making them ideal for chip coating processes.
The Tantalum Sputtering Targets excel in delivering a uniform and precise deposition of thin films onto semiconductor substrates. Their superior quality guarantees a smooth and flawless coating, enhancing the overall performance and reliability of your chips.
Crafted with utmost care, our Tantalum Sputtering Targets are built to withstand the rigorous demands of chip coating applications. Their exceptional thermal and chemical stability ensures a prolonged lifespan, reducing the need for frequent replacements and minimizing downtime.
Choose our Tantalum Sputtering Targets for your chip coating requirements and experience the professionalism and reliability that our products offer. Trust in our commitment to delivering top-notch quality and performance, backed by our expertise in the industry.
Invest in our Tantalum Sputtering Targets today and elevate your chip coating processes to new heights of excellence. Experience the difference of using a premium product that guarantees exceptional results and long-lasting performance.
| Part Name | Tantalum Target | Specifications | Ø203.2 x 3mm Thickness (customized) (Option: Target Bonded to Backing Plate) |
| Material | Ta | Purity | 99.99% |
| Common Applications | Semiconductor, Wafer & Chip, Microelectronic Senser, Aerospace, 5G Photoelectricity, Functional Coating | ||
Target material is one of the main materials for preparing thin films, mainly used in integrated circuits, flat panel displays, solar cells, recording media, smart glass, etc., with high requirements for material purity and stability. The working principle of sputtering target material: sputtering is one of the main technologies for preparing thin film materials. It uses ions generated by ion sources to accelerate and aggregate in vacuum, forming a high-speed ion beam that bombards the solid surface. The ions exchange kinetic energy with the solid surface atoms, causing the solid surface atoms to leave the solid and deposit on the substrate surface. The bombarded solid is the sputtering target material.
Introducing our high-quality Tantalum Sputtering Targets, specifically designed for chip coating applications. These Tantalum Sputtering Targets are meticulously crafted to meet the demands of the semiconductor industry. With utmost precision and professionalism, we offer a reliable solution for your coating needs.
Our Tantalum Sputtering Targets are manufactured using advanced techniques, ensuring exceptional purity and consistency. These targets are specifically engineered to provide optimal performance and durability, making them ideal for chip coating processes.
The Tantalum Sputtering Targets excel in delivering a uniform and precise deposition of thin films onto semiconductor substrates. Their superior quality guarantees a smooth and flawless coating, enhancing the overall performance and reliability of your chips.
Crafted with utmost care, our Tantalum Sputtering Targets are built to withstand the rigorous demands of chip coating applications. Their exceptional thermal and chemical stability ensures a prolonged lifespan, reducing the need for frequent replacements and minimizing downtime.
Choose our Tantalum Sputtering Targets for your chip coating requirements and experience the professionalism and reliability that our products offer. Trust in our commitment to delivering top-notch quality and performance, backed by our expertise in the industry.
Invest in our Tantalum Sputtering Targets today and elevate your chip coating processes to new heights of excellence. Experience the difference of using a premium product that guarantees exceptional results and long-lasting performance.
