Sputtering targets are essential in the semiconductor manufacturing process, playing a critical role in creating thin films that are foundational to modern electronic devices. These targets, which can be made from a variety of materials including metals, alloys, and compounds, are used in a physical

The coating target material is a sputtering source that forms various functional films on the substrate through magnetron sputtering, multi arc ion plating, or other types of coating systems under appropriate process conditions. Simply put, the target material is the target material bombarded by hig

Among various types of targets, semiconductor targets have the highest technical requirements, with purity requirements typically exceeding 5N5, and also have extremely high requirements for dimensional precisionSputtering target materials for semiconductorsThe semiconductor chip industry is one of